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钨镍共掺杂 V2O5薄膜的光电特性研究

2024-07-08王兴萍李毅庄嘉庆闫俊屹梅金城

光学仪器 2024年3期

王兴萍 李毅 庄嘉庆 闫俊屹 梅金城

摘要:利用溶胶–凝胶旋涂法和后退火工艺在FTO 导电玻璃上制备了钨镍共掺杂 V2O5薄膜,研究了薄膜在不同温度和不同偏压下的光电特性和相变特性。利用 X射线衍射仪(XRD)、扫描电子显微镜(SEM)和 X 射线光电子能谱仪(XPS)测试了钨镍共掺杂 V2O5薄膜的晶体结构、表面形貌和组分,分析了不同钨镍共掺杂浓度对 V2O5薄膜相变光电特性的影响。结果表明,当钨和镍的掺杂质量分数分别为3%和1.5%时,钨镍共掺杂的 V2O5薄膜的相变温度为218.5℃, 在可见光范围内有较高的透过率,在近红外1310 nm 波长处的光学透过率达48.83%,与未掺杂 V2O5薄膜的光学透过率相比提高了10.29%,薄膜电阻降低了30.53%,热致回线宽度收窄为15℃, 说明钨镍共掺杂的 V2O5薄膜具有良好的可逆相变光电特性,有望在新型光电器件领域得到较好的应用。

关键词:钨镍共掺杂;V2O5薄膜;溶胶–凝胶;热致相变;光学透过率;薄膜电阻

中图分类号: TO 484.4/TO 484.5 文献标志码: A

Preparation of tungsten-nickel co-doped V2O5 films by sol-gelmethod and photoelectric properties of thermally inducedphase transition

WANG Xingping1,LI Yi1,2,ZHUANG Jiaqing1,YAN Junyi1,MEI Jincheng1

(1. School of Optical-Electrical and Computer Engineering, University of Shanghai forScience and Technology, Shanghai 200093, China;

2. Shanghai Key Laboratory of Modern Optical Systems, University of Shanghai forScience and Technology, Shanghai 200093, China)

Abstract: In this paper, tungsten-nickel co-doped V2O5 films were prepared on FTO conductive glass by using sol-gel spin coating and annealing to study their photoelectric and phase transition propertiesatdifferenttemperaturesanddifferentbiasvoltage. Thecrystalstructure,surface morphology and components of tungsten-nickel co-doping V2O5 films were tested by XRD, SEM and XPS to analyze the effects of different tungsten-nickel co-doping concentrations on the phase transitionphotoelectricpropertiesofV2O5films. Theresultsshowthatwhenthedopingconcentrations of tungstenand nickel were respectively 3% and 1.5%, tungsten-nickel co-doped V2O5 films had a phase transition temperature of 218.5℃, a higher transmittance in the visible light range and the transmittance of 48.83% at 1310 nm wavelength. Comparing with the undoped V2O5 films, the optical transmittance and sheet resistance of the co-doped V2O5 films increased 10.29% anddecreased 30.53%,respectively,andthethermalhysteresisloopwidthwasalso narrowed to 15 ℃. It is expected to have better applications in the field of new optoelectronic devices based on their excellent reversible phase transition photoelectric properties.

Keywords: codopingof tungstenand nickel; V2O5 film; sol-gel; thermotropic phase transition; optical transmittance; sheet resistance

引言

钒氧化物的氧化态从 V2+到 V5+,其中 V2O5 是钒化学价态最高的氧化物,常见的有α-V2O5,另外还有其同质异型体β-V2O5、γ-V2O5、ω-V2O5 以及 MxV2O5钒青铜[1],它们具有层状结构,在室温下是 n 型半导体,具有正交晶体结构[2-3],能同时注入电子和离子,具有良好的相变可逆性和长周期循环稳定性[1]。此外,它们还具有宽的带隙(2.2~2.4 eV)、高吸收系数、热稳定性[3],当温度达到257℃左右时,可由半导体态转变为金属态[4]。因其独特的结构及其在电学、光学、物理化学和离子导电性等方面具有的优良性能,其在光电器件[5]、锂离子电池[6]、电致变色显示器件[7]、气敏传感器[8]、超级电容器[9]等方面具有广阔的应用前景。……

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